RHK PanScan

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Image of the Month
Posted Date: September 1, 2007
iotm-september-2007

Microscope:
SEM Column in RHK’s UHV AFM/STM/SEM

Controls:
SPM 1000 Control System featuring XPMProTM

Description :
SEM images of two STM tips in the RHK afm/stm/SEM system. The first STM probe crashed into a non-conducting surface which was unable to produce a tunneling current for feedback. However, RHK’s patented insitu tip replacement process allowed the researcher to be back up and running in 5 minutes, saving valuable scan time.

Courtesy of: Zhouhang Wang and Sergiy Pryadkin – RHK Technology, Inc.

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Image of the Month
Posted Date: August 1, 2007
institution

Microscope:
Homebuilt Ambient STM

Controls:
SPM 1000 Control System

Description :
Imaging Conditions –
-1.0 V, 10pA

Polydiacetylene nanowires can be formed by polymerizing a well-ordered monolayer of diacetylene derivative molecules. This image shows the nanowires as bright structures along with the unpolymerized molecules that appear as stripes in the background. The diacetylene derivative molecules (10,12-pentacosadiynoic acid) were deposited using a Langmuir-Schaefer technique and transferred to the graphite substrate. The monolayer was then polymerized by exposure to UV light (254 nm) to form polydiacetylene nanowires on the surface.

Courtesy of: Rajiv Giridharagopal and Kevin F. Kelly, Rice University

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Image of the Month
Posted Date: July 1, 2007
institution

Microscope:
RHK Technology UHV 750

Controls:
SPM 1000 Control System

Description :
STM image of an adalyer of yet undetermined species on Pd(111). The atomic corrugation along the rows is merely 15 pm. Imaging conditions are V=22.8 mV, I=1.01 nA.

Courtesy of: Jorge Anibal Boscoboinik and Wilfred T. Tysoe of the University of Wisconsin-Milwaukee

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Image of the Month
Posted Date: June 1, 2007
institution

Microscope:
RHK Technology UHV 350

Controls:
SPM 1000 Control System

Description :
Conductive probe atomic / friction force microscopy on silicon pn junction – Topographic, current, and friction images taken at the sample bias of +4V and -4V in contact AFM mode.

Jeong Young Park, Yabing Qi, D. F. Ogletree, P. A. Thiel, and M. Salmeron
Lawrence Berkeley National Laboratory, University of California, Berkeley and Ames Laboratory, Iowa State University

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