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Posted Date: October 18, 2017

Reference:
The Journal of Physical Chemistry C 121.19 (2017): 10470-10475

Figure 3. STM images after exposing Rh(111) to AO: (A) θO,total = 6.4 ML at Tdep = 700 K; (B) θO,total = 2.9 ML at Tdep = 350 K followed by 600 s anneal at 700 K; (C) θO,total = 0.9 ML at Tdep = 350 K followed by 600 s anneal at 700 K. Insets are LEED patterns (62 eV) taken after deposition. STM images were obtained at 30 K and conditions were (L to R) (A) 100 mV, 137 pA; 181 mV, 170 pA; 140 mV, 153 pA; (B) 50 mV, 400 pA; 70 mV, 410 pA; 50 mV, 400 pA; (C) 20 mV, 200 pA; 20 mV, 150 pA; 20 mV, 150 pA.

Figure 3. STM images after exposing Rh(111) to AO: (A) θO,total = 6.4 ML at Tdep = 700 K; (B) θO,total = 2.9 ML at Tdep = 350 K followed by 600 s anneal at 700 K; (C) θO,total = 0.9 ML at Tdep = 350 K followed by 600 s anneal at 700 K. Insets are LEED patterns (62 eV) taken after deposition. STM images were obtained at 30 K and conditions were (L to R) (A) 100 mV, 137 pA; 181 mV, 170 pA; 140 mV, 153 pA; (B) 50 mV, 400 pA; 70 mV, 410 pA; 50 mV, 400 pA; (C) 20 mV, 200 pA; 20 mV, 150 pA; 20 mV, 150 pA.

Abstract
Recent studies have shown the importance of oxide surfaces in heterogeneously catalyzed reactions. Because of the difficulties in reproducibly preparing oxidized metal surfaces, it is often unclear what species are thermodynamically stable and what factors effect the oxide formation process. In this work, we show that the thermodynamically stable phases on Rh(111) after exposure to atomic oxygen are the (2×1)- O adlayer and the trilayer surface oxide, RhO2. Formation of RhO2 was facilitated by surface defects and elevated concentrations of dissolved O atoms in the subsurface region. As the concentration of subsurface O atoms decreased, the coverage of RhO2 decreased so that only the (2×1)- O adlayer was present on the surface. The importance of subsurface oxygen species in RhO2 formation and stability indicates a complex relationship between surface structure and subsurface oxygen concentration.

Reference:
The Journal of Physical Chemistry C 121.19 (2017): 10470-10475

Credits:
Rachael G. Farber,† Marie E. Turano,† Eleanor C. N. Oskorep,† Noelle T. Wands,† Erin V. Iski,‡ and Daniel R. Killelea*,†

†Department of Chemistry & Biochemistry, Loyola University Chicago, 1068 West Sheridan Road, Chicago, Illinois 60660, United States

‡Department of Chemistry and Biochemistry, The University of Tulsa, 800 South Tucker Drive, Tulsa, Oklahoma 74104, United States

Microscope:
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Panscan Freedom SPM,  VT Beetle
Events
Event Date: September 25, 2017

September 25-29 Suzhou, China
NC-AFM 2017
The Conference will be held at the Garden Hotel Suzhou in Suzhou, China

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Panscan Freedom SPM,  VT Beetle
Events
Event Date: September 24, 2017

September 24 – 29 Montpellier, France
European Conference on Applications of Surface and Interface Analysis
The Conference will be held at Le CORUM, Esplanade Charles De Gaulle BP 2220 34000 Montpellier
http://www.ecasia2017.com/

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Panscan Freedom SPM,  VT Beetle
News
Posted Date: September 5, 2017

Small Business Innovation Research Program Provides Seed Funding for R&D

RHK Technology has been awarded a National Science Foundation (NSF) Small Business Technology Transfer (STTR) grant, in conjunction with Prof. Gang-yu Liu at University of California, Davis and Prof. Darrin Hanna at Oakland University, to conduct research and development work on a smart and fast SPM controller and microscope add-on for automatically finding dynamic features, scanning them at ultra-high-speed scan rates, and providing true material mechanical properties.  These achievements will expand AFM significantly, especially in the fields of nanodevice inspection and quality control, nanolithography, tissue engineering, and development of nanomaterials; an exciting leap forward.  With designing the microscope add-on proposed in this work to fit existing microscopes, thousands of scientists will have the option to utilize smart and fast scanning with their existing equipment.  The features provided in this smart and fast AFM will add important capabilities for imaging and characterization that will be used by professionals dedicated to engineering the future in research and development institutions and departments worldwide.

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